The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Jan. 06, 2023
Applicant:

Hitachi High-tech Analysis Corporation, Tokyo, JP;

Inventors:

Kazuyuki Hozawa, Tokyo, JP;

Takashi Takahama, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10F 30/295 (2025.01); H10F 71/00 (2025.01); H10F 77/1223 (2025.01); H10F 77/20 (2025.01);
U.S. Cl.
CPC ...
H10F 30/2955 (2025.01); H10F 71/121 (2025.01); H10F 77/1223 (2025.01); H10F 77/206 (2025.01);
Abstract

An semiconductor detector includes an n-type semiconductor substrate, a detection electrode formed on a first surface of the semiconductor substrate, a plurality of drift electrodes formed to surround the detection electrode and applied with a voltage causing a potential gradient in which a potential changes toward the detection electrode, a radiation incidence window provided on a second surface of the semiconductor substrate, a P-type semiconductor region formed by adding boron to a surface side on the second surface of the semiconductor substrate through the radiation incidence window, and a depleting electrode causing a reverse bias between the P-type semiconductor region formed on the second surface and an N-type semiconductor region formed in the semiconductor substrate. F is added to the P-type semiconductor region, and a region with the highest concentration of F is located deeper than a region with the highest concentration of B.


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