The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Jan. 10, 2023
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Andreas Peter Meiser, Sauerlach, DE;

Caspar Leendertz, Munich, DE;

Anton Mauder, Kolbermoor, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/83 (2025.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); H01L 21/04 (2006.01); H01L 21/308 (2006.01); H01L 21/31 (2006.01); H01L 21/311 (2006.01); H01L 21/426 (2006.01); H10D 12/00 (2025.01); H10D 12/01 (2025.01); H10D 30/01 (2025.01); H10D 30/66 (2025.01); H10D 30/83 (2025.01); H10D 62/10 (2025.01); H10D 62/832 (2025.01); H10D 64/00 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8325 (2025.01); H01L 21/02019 (2013.01); H01L 21/0334 (2013.01); H01L 21/0415 (2013.01); H01L 21/046 (2013.01); H01L 21/3083 (2013.01); H01L 21/31 (2013.01); H01L 21/311 (2013.01); H01L 21/426 (2013.01); H10D 12/038 (2025.01); H10D 12/481 (2025.01); H10D 30/0297 (2025.01); H10D 30/051 (2025.01); H10D 30/668 (2025.01); H10D 30/831 (2025.01); H10D 62/105 (2025.01); H10D 62/107 (2025.01); H10D 64/117 (2025.01); H10D 64/513 (2025.01);
Abstract

A semiconductor component includes: a SiC semiconductor body; a trench extending from a first surface of the SiC semiconductor body into the SiC semiconductor body, the trench having a conductive connection structure, a structure width at a bottom of the trench, and a dielectric layer covering sidewalls of the trench; a shielding region along the bottom and having a central section which has a lateral first width; and a contact formed between the conductive connection structure and the shielding region. The conductive connection structure is electrically connected to a source electrode. In at least one doping plane extending approximately parallel to the bottom, a dopant concentration in the central section deviates by not more than 10% from a maximum value of the dopant concentration in the shielding region in the doping plane. The first width is less than the structure width and is at least 30% of the structure width.


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