The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Mar. 16, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jeffrey Yat Shan Au, Sunnyvale, CA (US);

Sidharth Bhatia, Santa Cruz, CA (US);

Zhaozhao Zhu, Milpitas, CA (US);

Nicholas Ryan Pica, Meridian, ID (US);

Varoujan Chakarian, San Jose, CA (US);

Chenfei Hu, Cupertino, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/01 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); G01N 21/84 (2006.01); G01N 21/94 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4401 (2013.01); C23C 16/52 (2013.01); G01N 21/01 (2013.01); G01N 21/94 (2013.01); G01N 2021/0181 (2013.01); G01N 2021/8416 (2013.01);
Abstract

A method includes receiving, by a processing device, first data from an optical sensor of a processing chamber. The method further includes processing the first data to obtain second data. The second data includes an indication of a condition of a coating on an interior surface of the processing chamber. The method further includes generating an indication of performance of a processing operation of the processing chamber in view of the second data. The method further includes causing performance of a corrective action in view of the indication of performance of the processing chamber.


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