The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Nov. 10, 2022
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Khee Yong Lim, Singapore, SG;

Kian Ming Tan, Singapore, SG;

Kiok Boone Elgin Quek, Singapore, SG;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10F 30/225 (2025.01); H10F 71/00 (2025.01); H10F 77/122 (2025.01); H10F 77/20 (2025.01);
U.S. Cl.
CPC ...
H10F 30/2255 (2025.01); H10F 71/121 (2025.01); H10F 77/122 (2025.01); H10F 77/206 (2025.01);
Abstract

Structures for an avalanche photodetector and methods of forming a structure for an avalanche photodetector. The structure comprises a substrate having a first conductivity type, a first semiconductor layer that defines an absorption region of the avalanche photodetector, a dielectric layer between the first semiconductor layer and the substrate, a charge control region comprising a semiconductor material having a second conductivity type opposite to the first conductivity type and a different bandgap from the first semiconductor layer, and a second semiconductor layer that extends through the dielectric layer from the charge control region to the substrate. The second semiconductor layer defines a multiplication region of the avalanche photodetector.


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