The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

May. 05, 2023
Applicant:

Parabellum Strategic Opportunities Fund Llc, Wilmington, DE (US);

Inventor:

Jhon-Jhy Liaw, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 84/85 (2025.01); H10D 30/62 (2025.01);
U.S. Cl.
CPC ...
H10D 84/853 (2025.01); H10D 30/62 (2025.01); H10D 30/6219 (2025.01);
Abstract

A semiconductor device includes a substrate, a semiconductor fin, a gate structure, a source structure, a drain structure, a source contact, and a drain contact. The semiconductor fin extends upwardly from the substrate. The gate structure extends across the semiconductor fin. The source structure is on the semiconductor fin. The drain structure is on the semiconductor fin, in which the source and drain structures are respectively on opposite sides of the gate structure in a plan view. The source contact lands on the source structure and forms a rectangular pattern in the plan view. The drain contact lands on the drain structure and forms a circular pattern in the plan view, in which the rectangular pattern of the source contact has a length greater than a longest dimension of the circular pattern of the drain contact.


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