The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Nov. 30, 2020
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Jia-Ming Lin, Tainan, TW;
Shiu-Ko Jangjian, Tainan, TW;
Chun-Che Lin, Tainan, TW;
Ying-Lang Wang, Taichung, TW;
Wei-Ken Lin, Tainan, TW;
Chuan-Pu Liu, Tainan, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A structure of a semiconductor device includes a substrate, an isolation structure, and a liner layer. The isolation structure is embedded in the substrate. The isolation structure has a bottom surface and a sidewall. The liner layer is between the substrate and the isolation. A first portion of the liner layer in contact with the sidewall of the isolation structure has a nitrogen concentration lower than a second portion of the liner layer in contact with the bottom surface of the isolation structure.