Memory cell, memory cell arrangement, and methods thereof

Abstract

Various aspects relate to a memory cell including: a field-effect transistor structure, the field-effect transistor structure including a gate structure to control a current flow in a channel, the gate structure including a gate isolation and a floating gate, wherein at least a part of the gate structure extends from a surface of a semiconductor layer into the semiconductor layer; and a capacitive memory structure, the capacitive memory structure including at least two electrodes and a spontaneously polarizable layer disposed between the at least two electrodes, wherein one of the at least two electrodes is in direct physical contact with the floating gate of the field-effect transistor structure, and wherein the spontaneously polarizable layer is disposed over the surface of the semiconductor layer.