The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Dec. 17, 2020
Tdk Electronics Ag, Munich, DE;
TDK ELECTRONICS AG, Munich, DE;
Abstract
The present invention relates to a device for generating a dielectric barrier discharge for treatment of an object to be activated with non-thermal atmospheric pressure plasma, comprising a dielectric working chamber which has a wall of a dielectric material and which encloses a working space, wherein a metallization is applied to an outer side of the wall facing away from the working space, wherein the working space is an open volume, and a high-voltage source which is configured to apply a high voltage to the metallization or to the object to be activated when the object to be activated is in the working space. According to a further aspect, the invention relates to a method of treatment of an object to be activated with a non-thermal atmospheric pressure plasma.