The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Nov. 28, 2023
Applicant:

Infineon Technologies Canada Inc., Ottawa, CA;

Inventors:

Iman Abdali Mashhadi, Kanata, CA;

Regina Inyangat Akudo, Kanata, CA;

Syed Faizan-Ul-Haq Gilani, Stittsville, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/88 (2006.01); G01N 21/956 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01N 21/8851 (2013.01); G01N 21/95607 (2013.01); H01L 22/12 (2013.01);
Abstract

Automatic maverick screening of a subject wafer. An inspection pass status is acquired for each of multiple die on a subject wafer. For each of multiple zones of the subject wafer, a pass/fail percentage of the dies within the corresponding zone is compared with an expected pass/fail percentage for the corresponding zone. This expected pass/fail percentage is dependent on a history of pass/fail percentages for previous dies at a same corresponding zone for previously screened wafers. This comparison results in a deviation between the measured pass/fail percentage of the corresponding zone and the expected pass/fail percentage of the corresponding zone. Then, the subject wafer is automatically identified as a maverick wafer if the deviation of a predetermined number or more of the multiple zones falls outside of a corresponding deviation tolerance.


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