The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Aug. 08, 2022
Applicant:
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Inventors:
En Tian Lin, Taoyuan, TW;
Chiao-Ling Weng, Taichung, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C02F 1/42 (2023.01); C02F 1/467 (2023.01); C02F 1/58 (2023.01); C02F 101/16 (2006.01); C02F 103/34 (2006.01);
U.S. Cl.
CPC ...
C02F 1/4676 (2013.01); C02F 1/42 (2013.01); C02F 1/586 (2013.01); C02F 2001/425 (2013.01); C02F 2101/16 (2013.01); C02F 2103/346 (2013.01);
Abstract
The present disclosure provides a method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine. The method includes: adsorbing a plurality of ammonium (NH) ions in the liquid; desorbing the plurality of NHions to a solution; converting a fraction of the plurality of NHions into a plurality of ammonia (NH) molecules; and electrolyzing the plurality of NHmolecules to become a plurality of hydrogen (H) molecules and a plurality of nitrogen (N) molecules.