The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Jun. 25, 2021
Intel Corporation, Santa Clara, CA (US);
Rita H. Wouhaybi, Portland, OR (US);
Atul N. Hatalkar, Chandler, AZ (US);
Hassnaa Moustafa, Portland, OR (US);
Siew Wen Chin, Penang, MY;
Sangeeta Manepalli, Chandler, AZ (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Disclosed herein are embodiments of systems and methods for diversified imitation learning for automated machines. In an embodiment, a process-profiling system obtains sensor data captured by a plurality of sensors that are arranged to observe one or more human subjects performing one or more processes to accomplish one or more tasks. The process-profiling system clusters the sensor data based on a set of one or more process-performance criteria. The process-profiling system also performs, based on the clustered sensor data, one or both of generating and updating one or more process profiles in a plurality of process profiles. The process-profiling system selects, for one or more corresponding automated machines, one or more process profiles from among the plurality of process profiles, and the process-profiling system configures the one or more corresponding automated machines to operate according to the selected one or more process profiles.