The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Jun. 07, 2022
SK Innovation Co., Ltd., Seoul, KR;
SK Geo Centric Co., Ltd., Seoul, KR;
Eunjung Baek, Daejeon, KR;
Soyoung Park, Daejeon, KR;
Daesig Hong, Daejeon, KR;
Joohyun Nam, Daejeon, KR;
Jaemyoung Son, Daejeon, KR;
Byoungcheon Jo, Daejeon, KR;
SK Innovation Co., Ltd., Seoul, KR;
SK Geo Centric Co., Ltd., Seoul, KR;
Abstract
Provided is a polyethylene film having a multi-layer structure including an outer layer (A) including a first ethylene polymer having a density M1 of 0.935≤M1≤0.968; an intermediate layer (B) including a second ethylene polymer having a density M2 of 0.900≤M2≤0.920; and an inner layer (C) including a third ethylene polymer having a density M3 of 0.850≤M3≤0.905, wherein the outer layer (A), the intermediate layer (B), and the inner layer (C) are sequentially laminated to form the polyethylene film comprising the multi-layer structure, and wherein a falling ball impact strength per unit thickness and a puncture strength per unit thickness of the polyethylene film comprising the multi-layer structure are 3.0 to 15.0 g/μm and 0.2 to 0.4 N/μm, respectively, and a difference in melting point between the outer layer (A) and the inner layer (C) is 30 to 100° C.