The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jun. 22, 2022
Changxin Memory Technologies, Inc., Hefei, CN;
Jianping Wang, Hefei, CN;
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;
Abstract
A method for manufacturing a semiconductor device and a semiconductor device are provided. The method includes: providing a substrate including a first area and a second area; forming a stacked material layer on the substrate, where the stacked material layer includes a first dielectric layer, a first conductive layer, and a second conductive layer; performing a first etching process on the stacked material layer to remove the second conductive layer that is located on two end portions of the first area and a middle portion of the second area, so as to form a second gate layer and a resistor contact; and performing a second etching process on the stacked material layer to remain the first conductive layer located under the second gate layer and the resistor contact and the first conductive layer located on the middle portion of the second area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile