The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Sep. 27, 2023
Applicant:

Macom Technology Solutions Holdings, Inc., Lowell, MA (US);

Inventor:

Kevin J. Linthicum, Cary, NC (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/85 (2025.01); H01L 21/02 (2006.01); H10D 30/47 (2025.01); H10D 62/17 (2025.01); H10D 62/824 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8503 (2025.01); H01L 21/02381 (2013.01); H01L 21/02447 (2013.01); H01L 21/0254 (2013.01); H10D 30/47 (2025.01); H10D 62/221 (2025.01); H10D 62/824 (2025.01);
Abstract

Semiconductor structures that inhibit the conductivity of parasitic channels are described. In one example, a semiconductor structure includes a substrate, a III-nitride material region over a top surface of the substrate, a first species implanted within at least one region of surface region of the substrate in a first pattern spatially defined across a lateral dimension of the substrate, and a second species implanted within at least one region of the III-nitride material region. The second species can be implanted in a second pattern spatially defined across the lateral dimension of the substrate. The surface region of the substrate includes a parasitic channel. The at least one region of the substrate in which the first species is implanted includes a low-conductivity parasitic channel or is free of the parasitic channel.


Find Patent Forward Citations

Loading…