The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jul. 05, 2017
Applicant:
Tosoh Smd, Inc., Grove City, OH (US);
Inventors:
Eugene Y. Ivanov, Grove City, OH (US);
Christopher M. Jaworski, Grove City, OH (US);
Assignee:
TOSOH SMD, INC., Grove City, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/053 (2006.01); C04B 35/626 (2006.01); C04B 35/645 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C04B 35/053 (2013.01); C04B 35/6261 (2013.01); C04B 35/645 (2013.01); C23C 14/081 (2013.01); C23C 14/34 (2013.01); C23C 14/3414 (2013.01); C04B 2235/5409 (2013.01); C04B 2235/5445 (2013.01); C04B 2235/72 (2013.01); C04B 2235/77 (2013.01); C04B 2235/786 (2013.01); C04B 2235/9653 (2013.01);
Abstract
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cmor higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cmor higher, and an average crystal grain size of 50 μm or more.