The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Sep. 28, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Ronald Nasman, Albany, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 15/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 15/023 (2013.01); H01L 21/67017 (2013.01); B08B 2215/003 (2013.01);
Abstract

Embodiments of improved gas cabinets and associated methods are provided herein to reduce diffusion of process gas outside of a gas cabinet. In the disclosed embodiments, a gas cabinet is provided with: (a) an exhausted enclosure for housing at least one gas vessel (containing a process gas) and associated gas distribution components within an interior of the enclosure, (b) an air intake vent for drawing ambient air from outside of the exhausted enclosure into an interior of the exhausted enclosure, and (c) an air plenum that is mounted within the interior of the exhausted enclosure directly behind the air intake vent for increasing the airflow path length from the outside of the exhausted enclosure into the interior of the enclosure. By increasing the airflow path length, the air plenum provided within the gas cabinet reduces the diffusion of process gas outside of the exhausted enclosure.


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