The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Mar. 10, 2021
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Rostislav Rokitski, San Diego, CA (US);

Philip M. Conklin, San Diego, CA (US);

Cory Alan Stinson, San Diego, CA (US);

Alexander Anthony Schafgans, San Diego, CA (US);

Christoffel Johannes Liebenberg, San Marcos, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/23 (2006.01); H01S 3/00 (2006.01); H01S 3/10 (2006.01);
U.S. Cl.
CPC ...
H01S 3/2333 (2013.01); H01S 3/0085 (2013.01); H01S 3/1003 (2013.01); H01S 3/10061 (2013.01); H01S 3/2391 (2013.01);
Abstract

Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.


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