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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12441822 B1

PDFFull Text
Date of Patent:
Oct. 14, 2025

Filed:

Feb. 17, 2020

Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition

Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Hiroshi Hitokawa, Kakegawa, JP;

Tomohide Katayama, Kakegawa, JP;

Tomotsugu Yano, Kakegawa, JP;

Rui Zhang, Kakegawa, JP;

Aritaka Hishida, Kakegawa, JP;

Masato Suzuki, Kakegawa, JP;

Rikio Kozaki, Kakegawa, JP;

Toshiya Okamura, Kakegawa, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:

Faegre Drinker Biddle & Reath LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); C08F 220/34 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); H01L 21/027 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
C08F 220/346 (2020.02); C08F 220/281 (2020.02); C08F 220/301 (2020.02); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/2006 (2013.01); G03F 7/32 (2013.01); H01L 21/0276 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01);
Abstract

To provide a novel polymer capable of reducing sublimate during film formation and a composition comprising the same. The polymer (A) according to the present invention comprises at least one structural unit selected from the group consisting of Unit (a), Unit (b), Unit (c) and Unit (d) having certain structures, wherein, n, n, nand n, which are the numbers of repetition respectively of Units (a), (b), (c) and (d), satisfy the following formulae: n+n>0, n≥0 and n≥0.

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