The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Sep. 30, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Naoko Takeda, Tokyo, JP;
Natsuki Tsuno, Tokyo, JP;
Satoshi Takada, Tokyo, JP;
Yuto Hattori, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is a technique and the like capable of specifying irradiation areas or irradiation positions of a beam and a light as clearly as possible. A charged particle beam apparatusincludes: a position adjustment markprovided on a stageand irradiated with a beam bl and a light a; and a mechanism setting an irradiation position of the beam bl and an irradiation position of the light awith respect to the stageand changing a relative positional relationship including a distance between the irradiation position of the light aand the stage. A computer systemgenerates a first image in which the position adjustment markis reflected based on a first detection signal obtained by irradiating the position adjustment markwith the beam b, generates a second image in which an irradiation area of the light ais reflected in the vicinity of the position adjustment markbased on a second detection signal obtained by irradiating the position adjustment markwith the light a, and adjusts an irradiation position of the beam band an irradiation position of the light abased on the first image and the second image obtained when a positional relationship is changed by the mechanism.