The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Sep. 04, 2020
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventors:
Assignee:
Versum Materials US, LLC, Tempe, AZ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/401 (2013.01); C23C 16/4408 (2013.01); C23C 16/45553 (2013.01);
Abstract
An atomic layer deposition method for depositing a non-conformal silicon and oxygen containing film into surface features comprising vias and/or trenches on one or more substrates.
Wang, Meiliang. (2025). Compositions and methods using same for non-conformal deposition of silicon containing films (U.S. Patent No. 12435416). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12435416
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile