The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Jan. 17, 2025
Xi'an Jiaotong University, Xi'an, CN;
Xi'an Jiaotong University, Xi'an, CN;
Abstract
The present invention relates to the technical field of magnetron sputtering process, and specifically to a method for improving the uniformity of rare earth nickelate thin film deposited by reactive magnetron sputtering, comprising the following steps: adjusting the sputter angle of a Ni target toward a substrate to perform magnetron sputtering to deposit a thin film, and obtaining the content data of the Ni element in the deposited thin film; analyzing the content data of the Ni element to screen out the sputter angle for realizing zero-gradient deposition of the Ni element on the substrate surface; similarly, screening out the sputter angle for realizing zero-gradient deposition of the RE element on the substrate surface; preparing a nickelate thin film according to the screened zero-gradient sputter angle of Ni target material and the RE target material so as to improve the deposition uniformity of the rare earth nickelate thin film. The present invention aims to solve the problem that the introduction of reactive gas in the state of art magnetron sputtering process compromises the uniformity of the product thin film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile