The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Oct. 25, 2023
Gigaphoton Inc., Tochigi, JP;
Atsushi Ueda, Oyama, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
An extreme ultraviolet light generation chamber device includes a chamber including, at an internal space thereof, a plasma generation region; an etching gas supply port supplying an etching gas; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port and an opening at the outside of the chamber as an exhaust port; and a concentrating mirror reflecting extreme ultraviolet light generated at the plasma generation region and having passed through the inlet port. A first recessed portion is provided at a part of a first region among an inner peripheral surface of the partition wall. The first region is on a travel direction side of the laser light with respect to the plasma generation region and surrounded by a curved surface that forms 45 degrees with respect to the optical axis of the laser light.