The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Jul. 26, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Kai-Tai Chang, Kaohsiung, TW;

Tung Ying Lee, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
H01L 24/80 (2013.01); H01L 21/67092 (2013.01); H01L 21/68 (2013.01); H01L 21/681 (2013.01); H01L 22/12 (2013.01); H01L 23/544 (2013.01); H01L 24/83 (2013.01); H01L 21/682 (2013.01); H01L 24/08 (2013.01); H01L 24/94 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54453 (2013.01); H01L 2224/75753 (2013.01); H01L 2224/7595 (2013.01); H01L 2224/80006 (2013.01); H01L 2224/80097 (2013.01); H01L 2224/80125 (2013.01); H01L 2224/8013 (2013.01); H01L 2224/80357 (2013.01); H01L 2224/80815 (2013.01); H01L 2224/80895 (2013.01); H01L 2224/80896 (2013.01); H01L 2224/80908 (2013.01); H01L 2224/83091 (2013.01); H01L 2224/8312 (2013.01); H01L 2224/94 (2013.01);
Abstract

A method includes determining a first offset between a first alignment mark on a first side of a first wafer and a second alignment mark on a second side of the first wafer; aligning the first alignment mark of the first wafer to a third alignment mark on a first side of a second wafer, which includes detecting a location of the second alignment mark of the first wafer; determining a location of the first alignment mark of the first wafer based on the first offset and the location of the second alignment mark of the first wafer; and, based on the determined location of the first alignment mark, repositioning the first wafer to align the first alignment mark to the third alignment mark; and bonding the first side of the first wafer to the first side of the second wafer to form a bonded structure.


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