The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Nov. 01, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Ning Li, San Jose, CA (US);
Victor Nguyen, Novato, CA (US);
Mihaela Balseanu, Sunnyvale, CA (US);
Li-Qun Xia, Cupertino, CA (US);
Keiichi Tanaka, San Jose, CA (US);
Steven D. Marcus, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); C23C 16/45551 (2013.01); H01J 37/32357 (2013.01); H01J 37/3244 (2013.01); H01L 21/0337 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01);
Abstract
Provided are self-aligned double patterning methods including feature trimming. The SADP process is performed in a single batch processing chamber in which the substrate is laterally moved between sections of the processing chamber separated by gas curtains so that each section independently has a process condition.