The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
May. 03, 2024
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Yun-Yue Lin, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Abstract
A method for forming a structure of a pellicle-mask structure is provided. The method includes forming a mask pattern on a mask substrate. The method also includes bonding a pellicle frame to the mask pattern through a pellicle frame adhesive. The method further includes forming a vent structure in the pellicle frame. In addition, the method includes bonding a pellicle membrane to the pellicle frame. The pellicle membrane includes a peripheral portion over the pellicle frame and a top membrane portion over the peripheral portion, and a lateral width of the peripheral portion of the pellicle membrane is greater than a lateral width of the pellicle frame adhesive.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile