The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Aug. 09, 2022
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Shuichiro Honda, Tokyo, JP;

Tetsuji Kasatani, Tokyo, JP;

Hayato Ikeda, Tokyo, JP;

Mitsutaka Iwami, Tokyo, JP;

Kei Wataji, Tokyo, JP;

Hyuga Kikuchi, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F04D 13/08 (2006.01); F04D 7/00 (2006.01); F04D 19/04 (2006.01);
U.S. Cl.
CPC ...
F04D 13/08 (2013.01); F04D 7/00 (2013.01); F04D 19/04 (2013.01); F17C 2227/0135 (2013.01);
Abstract

A purge apparatus is provided. The purge apparatus is capable of preventing air from being entrained when a submersible pump is moved into a pump column, and capable of warming the submersible pump when the submersible pump is removed from the pump column to thereby prevent component of the air from being liquefied, thus preventing the liquefied gas from being emitted in the atmosphere. The purge apparatus includes a hermetic purge container configured to accommodate the submersible pump therein; a vacuum line coupled to the hermetic purge container and coupled to a vacuum source; a purge-gas supply line coupled to the hermetic purge container and coupled to a purge-gas supply source; and a purge-gas supply valve mounted to the purge-gas supply line.


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