The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Jun. 10, 2022
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Ki Sang Eum, Cheonan-si, KR;
Woo Ram Lee, Seoul, KR;
Jong Wha Kang, Cheonan-si, KR;
Dong Woon Park, Seoul, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45563 (2013.01); C23C 16/4412 (2013.01); C23C 16/4586 (2013.01); C23C 16/46 (2013.01);
Abstract
Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes a chamber having an inner space, a support unit configured to support the substrate in the inner space, a gas supply tube configured to supply a gas onto the substrate supported on the support unit, a gas exhaust tube configured to exhaust the gas from the inner space, and a gas block connected to the gas supply tube and the gas exhaust tube and provided above the chamber.