The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Sep. 06, 2022
Kioxia Corporation, Tokyo, JP;
Shusaku Matsumoto, Saitama Saitama, JP;
Koichiro Kawano, Kamakura Kanagawa, JP;
Shiguma Kato, Yokohama Kanagawa, JP;
Kioxia Corporation, Tokyo, JP;
Abstract
A substrate processing apparatus of an embodiment includes: a processing tank that stores a processing solution and houses a plurality of substrates that are to be processed with the processing solution, with the substrates being arranged in a predetermined direction; an inner wall provided in the processing tank to cover at least a partial portion of a substrate surface located at one end in terms of the arrangement direction of the substrates and at least partial portions of side surfaces, of the substrates, that line up along the arrangement direction, with a space where the processing solution flows being present between the inner wall and a bottom surface of the processing tank; and a processing solution nozzle provided at a position that is in the processing tank and outside the inner wall and opening in a manner to cause an upward flow to be formed inside the inner wall.