The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Mar. 21, 2022
Asml Holding N.v., Veldhoven, NL;
Asml Netherlands B.v., Veldhoven, NL;
Mahesh Upendra Ajgaonkar, Guilford, CT (US);
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Laurentius Johannes Adrianus Van Bokhoven, Bergeijk, NL;
Joost André Klugkist, Waalre, NL;
Koen Martin Willem Jan Bos, Eindhoven, NL;
ASML NETHERLANDS B.V. & ASML HOLDING N.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system, a projection system, a temperature-sensitive object, and a temperature sensor that includes a detector and waveguide device that is thermally coupled to the temperature-sensitive object and includes an input end, a downstream end, and first and second scattering features. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Based on temperature, the first scattering feature reflects a first spectrum. Radiation not reflected by the first scattering feature is allowed downstream. Based on temperature, the second scattering feature reflects a second spectrum different from the first spectrum. Radiation not reflected by the second scattering feature is allowed downstream. The detector is disposed to receive radiation including the reflected first and second spectra from the input end and generates a measurement signal based on the received radiation.