The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2025

Filed:

Oct. 13, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Wen-Shun Lo, Hsinchu County, TW;

Tai-Yi Wu, Hsinchu County, TW;

Yingkit Felix Tsui, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 41/35 (2023.01); H01L 21/266 (2006.01); H10B 41/41 (2023.01); H10B 41/42 (2023.01); H10D 1/00 (2025.01); H10D 1/66 (2025.01); H10D 30/01 (2025.01); H10D 30/68 (2025.01);
U.S. Cl.
CPC ...
H10B 41/35 (2023.02); H01L 21/266 (2013.01); H10B 41/41 (2023.02); H10B 41/42 (2023.02); H10D 1/047 (2025.01); H10D 1/66 (2025.01); H10D 30/0411 (2025.01); H10D 30/681 (2025.01);
Abstract

A memory device includes a substrate, a first transistor, a second transistor, and a capacitor. The first transistor is over the substrate and includes a select gate. The second transistor is over the substrate and connected to the first transistor in series, in which the second transistor includes a floating gate. The capacitor is over the substrate and connected to the second transistor, wherein the capacitor includes a top electrode, a bottom electrode in the substrate, and an insulating layer between the top electrode and the bottom electrode. The insulating layer includes nitrogen. A nitrogen concentration of the insulating layer increases in a direction from the top electrode to the bottom electrode.


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