The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
May. 12, 2022
Screen Holdings Co., Ltd., Kyoto, JP;
Takaaki Ishizu, Kyoto, JP;
Yuta Nakano, Kyoto, JP;
SCREEN HOLDINGS CO., LTD., , JP;
Abstract
A substrate processing method includes a step of supplying a dry processing liquid onto the upper surface of the substrate, to thereby form a liquid film of the dry processing liquid on the upper surface of the substrate (Step S), a step of heating the substrate from the side of a lower surface thereof in a state where the liquid film of the dry processing liquid is formed on the upper surface thereof (Step S), and a step of drying the substrate (Step S). The surface tension of the dry processing liquid is lower than that of the rinse liquid. The boiling point of the dry processing liquid is higher than that of the rinse liquid. The heating temperature of the substrate in Step Sis not lower than the boiling point of the rinse liquid and lower than that of the dry processing liquid.