The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
Jun. 09, 2020
Asml Netherlands B.v., Veldhoven, NL;
Arie Van Den Brin, Gemert, NL;
Simon Hendrik Celine Van Gorp, Oud-Turnhout, BE;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Apparatus and methods for determining a focus error for a lithographic apparatus and/or a difference between first and second metrology data. The first and/or second metrology data includes a plurality of values of a parameter relating to a substrate, the substrate including a plurality of fields including device topology. The apparatus may include a processor configured to execute computer program code to cause the processor to: determine an intra-field component of the parameter; remove the determined intra-field component from the first metrology data to obtain an inter-field component of the first metrology data; and determine the difference between the first metrology data and second metrology data based on the inter-field component and the second metrology data.