The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2025

Filed:

Sep. 01, 2023
Applicant:

Himax Technologies Limited, Tainan, TW;

Inventors:

Chih-Sheng Chang, Tainan, TW;

Meng-Ko Tsai, Tainan, TW;

Chung-Kai Sheng, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1852 (2013.01); G03F 7/0002 (2013.01); G03F 7/001 (2013.01); G02B 5/1876 (2013.01); G02B 5/188 (2013.01);
Abstract

A diffractive optical element and method for fabricating the diffractive optical element are provided. The diffractive optical element includes a substrate, a first diffractive structure layer and a second diffractive structure layer. The substrate has a first surface and a second surface opposite to the first surface. The first diffractive structure layer is disposed on the first surface of the substrate. The second diffractive structure layer is disposed on the second surface of the substrate. In the method for fabricating the diffractive optical element, at first, the substrate is provided. Then, a first glue material layer/first semiconductor layer is formed and patterned on the first surface of the substrate. Thereafter, a second glue material layer/second semiconductor layer is formed and patterned on the second surface of the substrate.


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