The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Jan. 05, 2023
Excelliance Mos Corporation, Hsinchu County, TW;
Chu-Kuang Liu, Hsinchu County, TW;
Hung-Kun Yang, Hsinchu County, TW;
Excelliance MOS Corporation, Hsinchu, TW;
Abstract
A manufacturing method of a split gate trench device includes forming an epitaxial layer on a substrate, and forming a trench in the epitaxial layer, wherein the trench is divided into a first part and a second part above the first part. A shielding gate and a shielding oxide layer are then formed in the first part, wherein the shielding oxide layer is located between the shielding gate and the trench and exposes the second part. The second part is filled with an oxide, two grooves having a contour that is wide at the top and narrow at the bottom are then formed in the oxide, and a part of a sidewall of the trench is exposed. A gate oxide layer is formed on an exposed surface of the sidewall, and a first top gate and a second top gate are then formed in each of the two grooves.