The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Mar. 14, 2022
Applicant:

Sandisk Technologies Llc, Addison, TX (US);

Inventors:

Jordan Katine, Mountain View, CA (US);

Lei Wan, San Jose, CA (US);

Assignee:

Sandisk Technologies, Inc., Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 61/00 (2023.01); G11C 11/16 (2006.01); H10N 50/01 (2023.01); H10N 50/10 (2023.01); H10N 50/80 (2023.01); H10N 50/85 (2023.01);
U.S. Cl.
CPC ...
H10B 61/10 (2023.02); G11C 11/1655 (2013.01); H10N 50/01 (2023.02); H10N 50/10 (2023.02); H10N 50/80 (2023.02); H10N 50/85 (2023.02); G11C 11/161 (2013.01); G11C 11/1659 (2013.01);
Abstract

Selector material layers are formed over the first electrically conductive lines, and magnetic tunnel junction material layers are formed over the selector material layers. The magnetic tunnel junction material layers are patterned into a two-dimensional array of magnetic tunnel junction (MTJ) pillar structures. A dielectric spacer material layer is deposited over the two-dimensional array of MTJ pillar structures. The dielectric spacer material layer and the selector material layers are anisotropically etched. Patterned portions of the selector material layers include a two-dimensional array of selector-containing pillar structures. Second electrically conductive lines are formed over the two-dimensional array of MTJ pillar structures.


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