The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Feb. 08, 2022
International Business Machines Corporation, Armonk, NY (US);
Brian Veraa, Round Rock, TX (US);
Ryan Michael Kruse, Williamson, TX (US);
Christopher Gonzalez, Shelburne, VT (US);
David Wolpert, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Aspects of the invention include systems and methods configured to provide hierarchical circuit designs that makes use of effective metal density screens during hierarchical design rule checking (DRC) analysis. A non-limiting example computer-implemented method includes providing a first hierarchical level of a chip design. The first hierarchical level includes one or more internal shapes and at least one blockage shape having an internal structure defined at a second hierarchical level of the chip design. A tuple is assigned to the blockage shape. The tuple includes a metal layer identifier for the blockage shape, a minimum expected density for the blockage shape, and a maximum expected density for the blockage shape. The method includes determining whether a density violation exists in the first hierarchical level based in part on one or both of the minimum expected density for the blockage shape and the maximum expected density for the blockage shape.