The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
May. 24, 2024
Kla Corporation, Milpitas, CA (US);
Vladimir Levinski, Migdal HaEmek, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
An overlay metrology system may generate overlay measurements based on isolated images of features on different layers of an overlay target. For example, a target may include a first-layer structure including periodic features with a fine pitch selected to be unresolved by the overlay metrology system, where the gratings structures are oriented to rotate a polarization of rotated diffraction orders relative to a polarization of incident illumination, where the rotated diffraction orders include at least first-order diffraction. In this way, first images generated with a collection polarizer oriented to capture the rotated diffraction orders may include only the first-layer structure, whereas second images generated with a collection polarizer oriented to be aligned with a polarization of incident illumination may include only the second-layer features.