The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Apr. 14, 2022
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Chandra S. Tiwari, Boise, ID (US);

David A. Kewley, Boise, ID (US);

Deep Panjwani, Boise, ID (US);

Matthew Holland, Victor, NY (US);

Matthew J. King, Boise, ID (US);

Michael E. Koltonski, Boise, ID (US);

Tom J. John, Boise, ID (US);

Xiaosong Zhang, Boise, ID (US);

Yi Hu, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/532 (2006.01); H10B 41/10 (2023.01); H10B 41/30 (2023.01); H10B 41/35 (2023.01); H10B 41/48 (2023.01); H10B 43/10 (2023.01); H10B 43/27 (2023.01); H10B 43/35 (2023.01); H10B 80/00 (2023.01); H10B 41/27 (2023.01);
U.S. Cl.
CPC ...
H01L 21/76897 (2013.01); H01L 21/76832 (2013.01); H01L 23/53295 (2013.01); H10B 41/27 (2023.02); H10B 41/30 (2023.02); H10B 41/48 (2023.02);
Abstract

A microelectronic device comprises a stack structure comprising alternating conductive structures and insulative structures. Memory cells vertically extend through the stack structure, and comprise a channel material vertically extending through the stack structure. An additional stack structure vertically overlies the stack structure and comprises additional conductive structures and additional insulative structures. First pillar structures extend through the additional stack structure and vertically overlie a portion of the memory cells. Second pillar structures are adjacent to the first pillar structures and extend through the additional stack structure and vertically overlie another portion of the memory cells. Slot structures are laterally adjacent to the first pillar structures and to the second pillar structures and extend through at least a portion of the additional stack structure. A distance between the first pillar structures and the slot structures is substantially equal to a distance between the second pillar structures and the slot structures.


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