The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Apr. 25, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Blake Erickson, Gilroy, CA (US);

Keith Berding, Truckee, CA (US);

Michael Kutney, Santa Clara, CA (US);

Zhaozhao Zhu, Milpitas, CA (US);

Tsung Feng Wu, San Jose, CA (US);

Michael D. Willwerth, Campbell, CA (US);

Jeffrey Ludwig, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/32 (2006.01); G01J 3/02 (2006.01); G01J 3/443 (2006.01); G01N 21/21 (2006.01); G01N 21/25 (2006.01); G01N 21/68 (2006.01); G01N 21/84 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01J 3/32 (2013.01); G01J 3/0291 (2013.01); G01N 21/255 (2013.01); G01N 21/68 (2013.01); G01N 21/9501 (2013.01); G01J 3/443 (2013.01); G01N 21/211 (2013.01); G01N 2021/8416 (2013.01);
Abstract

An apparatus includes a base component and a plurality of collimators housed within the base component. Each collimator of the plurality of collimators corresponds to a respective location of a plurality of locations of a wafer in an etch chamber. The plurality of locations includes a center location of the wafer, a plurality of inner ring locations along an inner ring of the wafer associated with a first set of radially symmetric optical emission spectroscopy (OES) signal sampling paths, and a plurality of outer ring locations along an outer ring of the wafer associated with a second set of radially symmetric OES signal sampling paths.


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