The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Jun. 30, 2022
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Diana Wofk, Santa Clara, CA (US);

Rene Ranftl, Munich, DE;

Matthias Mueller, Munich, DE;

Vladlen Koltun, Santa Clara, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/50 (2017.01);
U.S. Cl.
CPC ...
G06T 7/50 (2017.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01);
Abstract

Methods, apparatus, systems, and articles of manufacture are disclosed for metric depth estimation using a monocular visual-inertial system. An example apparatus for metric depth estimation includes at least one memory, instructions in the apparatus, and processor circuitry to execute the instructions to access a globally-aligned depth prediction, the globally-aligned depth prediction generated based on a monocular depth estimator, access a dense scale map scaffolding, the dense scale map scaffolding generated based on visual-inertial odometry, regress a dense scale residual map determined using the globally-aligned depth prediction and the dense scale map scaffolding, and apply the dense scale residual map to the globally-aligned depth prediction.


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