The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Dec. 28, 2021
International Business Machines Corporation, Armonk, NY (US);
Cheng Chi, Jersey City, NJ (US);
Julian Timothy Dolby, Bronx, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A computer-implemented method is provided for creating a photolithographic mask. The method includes, in a model building stage, obtaining lithography polygon coordinates from an input lithography target layout. The method further includes, in the model building stage, obtaining mask polygon coordinates from an input mask layout from a test mask. The method also includes, in the model building stage, obtaining correlated mask to lithography features from the lithography polygon coordinates and the mask polygon coordinates. The method additionally includes, in the model building stage, performing linear regression on the correlated mask to lithography features to obtain a machine learning model for predicting an output mask from an input lithography target design. The method further includes, in an inference stage, predicting a given output mask from a given input lithography target design using the machine learning model.