The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Jul. 03, 2023
Applicant:

Sandisk Technologies, Inc., Milpitas, CA (US);

Inventors:

Troy Guan, Shanghai, CN;

Liang Li, Shanghai, CN;

Wendy Yu, Shanghai, CN;

Assignee:

Sandisk Technologies, Inc., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/00 (2006.01); G06F 11/27 (2006.01);
U.S. Cl.
CPC ...
G06F 11/27 (2013.01);
Abstract

In a word line leakage detection process in a NAND or other non-volatile memory device, a stress selected set of word lines have a high stress voltage applied while other parts of an array are biased to a low level. While stressing the memory array, the current drawn by the array is compared to a leakage detection current that increases in amplitude. For example, this can be done by mirroring the array current and comparing this with the current from a current source that increases in response to a digital input value and determining when it exceeds the mirror current, at which point the stress is discontinued. In addition to determining the amount of leakage, this approach results in low leakage word lines receiving less stress, while greater leakage result in greater amounts of stress being applied.


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