The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Mar. 07, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yangyang Sun, San Jose, CA (US);

Jinxin Fu, Fremont, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/26 (2006.01); G02B 3/00 (2006.01); G02B 5/30 (2006.01); G02B 26/12 (2006.01);
U.S. Cl.
CPC ...
G01B 11/26 (2013.01); G02B 3/00 (2013.01); G02B 5/3025 (2013.01); G02B 26/123 (2013.01); G02B 2207/123 (2013.01);
Abstract

Embodiments described herein provide for a measurement system having an aperture filtering component and methods of utilizing the measurement system. The measurement system described herein includes a measurement arm and a stage. The measurement arm projects a light beam to a top surface of an optical device structure. Multi-reflection beams resulting from reflections and diffraction off other surfaces of a non-opaque substrate leads to interference. The measurement arm includes an aperture (e.g., an aperture filtering component) that filters the multi-reflection beams from being relayed to the detector. As such, only images of the light beam are relayed to the detector.


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