The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Jan. 13, 2022
Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;
Taesung Kim, Seoul, KR;
Seokjun Hong, Siheung-si, KR;
Sanghyeon Park, Gunpo-si, KR;
Jaewon Lee, Yongin-si, KR;
Hyeonmin Seo, Suwon-si, KR;
Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;
Abstract
The present application relates to a method for preparing a polishing slurry, the method including the steps of preparing a solution containing abrasive particles and a fluid, passing the solution through a porous membrane filter region, and preparing a polishing slurry by removing the fluid from the solution that has passed through the region, in which in the step of passing the solution through the region, those with a mean particle size of 100 nm or less among the abrasive particles are removed by a tangential flow filtration method.