The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Feb. 02, 2022
Applicant:

Hitachi, Ltd, Tokyo, JP;

Inventors:

Digh Hisamoto, Tokyo, JP;

Satoru Akiyama, Tokyo, JP;

Toshiyuki Mine, Tokyo, JP;

Noriyuki Lee, Tokyo, JP;

Gou Shinkai, Tokyo, JP;

Shinichi Saito, Tokyo, JP;

Ryuta Tsuchiya, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 60/10 (2023.01); G06N 10/40 (2022.01); H10N 60/01 (2023.01); H10N 69/00 (2023.01);
U.S. Cl.
CPC ...
H10N 60/128 (2023.02); G06N 10/40 (2022.01); H10N 60/01 (2023.02); H10N 60/11 (2023.02); H10N 69/00 (2023.02);
Abstract

A semiconductor device includes an active region famed in a semiconductor layer formed on an insulating film famed in a semiconductor substrate and having a first extension portion extending in a first direction and a second extension portion extending in a second direction intersecting with the first direction, a first diffusion layer electrode of a first conductivity type provided in the first extension portion, second and third diffusion layer electrodes of a second conductivity type provided in the second extension portion so as to interpose a first connecting portion connecting the first extension portion and the second extension portion, a first gate electrode famed on the first extension portion between the first diffusion layer electrode and the first connecting portion through an insulating film famed on the semiconductor layer, and a second gate electrode famed on the first connecting portion through the insulating film famed on the semiconductor layer.


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