The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

May. 26, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yuji Mimura, Koshi, JP;

Hiroshi Maeda, Koshi, JP;

Takashi Terada, Koshi, JP;

Masaru Honda, Koshi, JP;

Ryoichi Sakamoto, Koshi, JP;

Yutaka Yamasaki, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 24/80 (2013.01); H01J 37/32449 (2013.01); H01L 24/74 (2013.01); H01J 2237/338 (2013.01); H01L 24/08 (2013.01); H01L 2224/08145 (2013.01); H01L 2224/80009 (2013.01); H01L 2224/80896 (2013.01);
Abstract

A bonding system includes a surface modifying apparatus and a bonding apparatus. The surface modifying apparatus is configured to modify a bonding surface of a substrate to be bonded to another substrate with plasma of a processing gas. The bonding apparatus is configured to bond two substrates modified by the surface modifying apparatus by an intermolecular force. The surface modifying apparatus includes: a processing chamber configured to accommodate therein the substrate; a processing gas supply configured to supply a processing gas containing moisture into the processing chamber; and a plasma forming unit configured to form the plasma of the processing gas containing the moisture.


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