The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Aug. 31, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
This alignment device aligns a stageand a waferby comparing alignment images captured by respective two chips of the waferon the stage. The alignment device comprises: the stagethat holds the wafer; an alignment illumination light sourcethat irradiates the waferheld on the stagewith light; an alignment a image processing unitthat receives light from the waferand acquires the alignment images; an information input/output unitthat inputs and outputs information; and an alignment processing unitthat processes information from the image processing unitfor alignment information input/output unit. The alignment processing unitsets an alignment image captured on a first wafer as a reference image, quantifies, on the basis of a difference obtained by comparing the reference image with an alignment image captured on a second wafer, sequential change information of a wafer surface state from a time when the first wafer is captured to a time when the second wafer is captured, and displays the quantified sequential change information on the information input/output unit