The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Nov. 18, 2022
Applicants:

SK Hynix Inc., Icheon-si, KR;

Eugene Technology Co., Ltd., Yongin-si, KR;

Inventors:

Min Jin Jung, Hwaseong-si, KR;

Tae Hwan Kim, Yongin-si, KR;

Min Woong Kang, Hwaseong-si, KR;

Hyun Jun Yoo, Seoul, KR;

Sung Ho Kang, Yongin-si, KR;

Song Hwan Park, Yongin-si, KR;

Bo Sun Kim, Yongin-si, KR;

Hong Won Lee, Yongin-si, KR;

Joo Hyun Cho, Yongin-si, KR;

Yong Tak Jin, Yongin-si, KR;

Assignees:

SK hynix Inc., Icheon-si, KR;

EUGENE TECHNOLOGY CO., LTD., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27B 5/16 (2006.01); F27B 5/06 (2006.01); F27B 5/14 (2006.01); F27B 5/18 (2006.01); F27B 17/00 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
F27B 5/16 (2013.01); F27B 5/14 (2013.01); F27B 5/18 (2013.01); F27B 17/0025 (2013.01); F27B 2005/064 (2013.01); H01L 21/67248 (2013.01); H01L 21/67303 (2013.01);
Abstract

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.


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