The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Dec. 22, 2024
Applicant:

Monolithic 3d Inc., Klamath Falls, OR (US);

Inventors:

Zvi Or-Bach, Haifa, IL;

Jin-Woo Han, San Jose, CA (US);

Assignee:

Monolithic 3D Inc., Klamath Falls, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H01L 23/528 (2006.01); H10B 41/10 (2023.01); H10B 41/20 (2023.01); H10B 43/10 (2023.01); H10B 43/20 (2023.01); H10B 53/20 (2023.01); H10D 30/63 (2025.01); H10D 30/69 (2025.01); H10D 62/834 (2025.01); H10D 64/64 (2025.01); H10D 89/10 (2025.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H01L 23/5283 (2013.01); H10B 43/10 (2023.02); H10B 43/20 (2023.02); H10D 30/63 (2025.01); H10D 30/69 (2025.01); H10D 62/834 (2025.01); H10D 64/64 (2025.01); H10D 89/10 (2025.01); H10B 41/10 (2023.02); H10B 41/20 (2023.02); H10B 53/20 (2023.02);
Abstract

A 3D semiconductor device including: a first level including a single crystal layer and a memory control circuit including first transistors and a redundancy control circuit; a first metal layer overlaying the single crystal layer; a second metal layer overlaying the first metal layer; a third metal layer overlaying the second metal layer; second transistors disposed atop the third metal layer with at least one including a metal gate; third transistors disposed atop the second transistors; a fourth metal layer atop the third transistors; a memory array including word-lines and at least four memory mini arrays, each including at least four rows by four columns of memory cells, each of the memory cells includes at least one of the second transistors or at least one of the third transistors; a connection path from the fourth metal to the third metal including a via disposed through the memory array.


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