The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Jul. 29, 2022
Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventor:

Yi Tang, Hefei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H10B 12/30 (2023.02); H10B 12/03 (2023.02); H10B 12/05 (2023.02); H10B 12/482 (2023.02);
Abstract

The present disclosure relates to a memory and a forming method thereof. The method of forming a memory includes: forming a stacked layer on a surface of a substrate, the stacked layer including interlayer isolation layers arranged at intervals in a first direction and a sacrificial layer group located between adjacent two of the interlayer isolation layers, the sacrificial layer group including a first sacrificial layer, a second sacrificial layer, and a third sacrificial layer sequentially stacked in the first direction, and the stacked layer including a transistor region, where the first direction is a direction perpendicular to a top surface of the substrate; removing the first sacrificial layer in the transistor region to form a first gap; forming an active pillar in the first gap; removing the second sacrificial layer and the third sacrificial layer in the transistor region to form a second gap.


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